Purpose. For carrying out ion implantation of materials with single/double row metal ions (Be, Fe, Cr, Ni, Zr, Mo, W, etc.) and simulation studies of the effect of ion irradiation on structural materials of nuclear and thermonuclear technology.
Specifications:
- beam ion type Be, Fe, Cr, Ni, Zr, Mo, W
- Ion current, μA 10—200
- Ion energy, keV 30
- Ion charge +1, +2
- power consumption, W 1000.
Application area. Energy, nuclear power.
Advantages. The source of metal ions makes it possible to generate beams of singly and doubly charged metal ions based on ion-plasma sputtering. The method of creating a working medium used in an ion source makes it possible to form an atomic concentration and high-density plasma of almost any metals (Be, Fe, Cr, Ni, Zr, Mo, W, etc.), without the need to heat the source to high temperatures.