Purpose. Use in plasma technology as an ion source for nano- and microanalytical analyzers, mass spectrometers with inductively coupled plasma.
Specifications:
- Designed as a compact plasma generator with permanent magnet systems.
- Type of beam ions H+, He+, Ar+
- Beam brightness 300 A/m2 ⋅rad2 ⋅ eV
- Plasma concentration n ~ 1013 ⋅ cm–3
- Operating gas pressure, mTorr 10
- Consumed RF power, W.
Application area. Nano and electronics.
Advantages. Compared with known analogues, the developed ion sources consume 10 times less energy at the same ion current parameters. An increase in the plasma density in the source is achieved by creating an effective RF discharge with an external magnetic field.